This deliverable reports the installation and validation of physical vapour deposition (PVD) equipment. Two demonstrator units were integrated: a linear evaporation source and a radio frequency (RF) magnetron for soft sputtering. The RF magnetron was successfully integrated, with plasma stability optimized to reduce secondary discharges and arcing, enabling initial low-damage indium tin oxide deposition. These upgrades establish the readiness of PVD tools for pilot-line operation and provide a foundation for further process optimization.